Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
نویسندگان
چکیده
منابع مشابه
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
In this study, the influence of direct current (DC) biasing on the growth of titanium dioxide (TiO₂) layers and their nucleation behavior has been investigated. Titania films were prepared by plasma enhanced atomic layer deposition (PEALD) using Ti(OiPr)₄ as metal organic precursor. Oxygen plasma, provided by remote inductively coupled plasma, was used as an oxygen source. The TiO₂ films were d...
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ژورنال
عنوان ژورنال: Materials
سال: 2015
ISSN: 1996-1944
DOI: 10.3390/ma8115425